An Application Of A Dry Deposition Model Including The Chemical Reactions Of NO-NO2-O3
Price
Free (open access)
Transaction
Volume
10
Pages
8
Published
1995
Size
605 kb
Paper DOI
10.2495/AIR950112
Copyright
WIT Press
Author(s)
J. Padro, L. Zhang, W.J. Massman & D.W. Stocked
Abstract
An application of a dry deposition model including the chemical reactions of NO-NO^-O, J. Padro," L. Zhang/ W.J. Massman,* D.W. Stocked "Atmospheric Environment Service, 4905 Duffer in Street, Downsview, Ontario, Canada, M3H 5T4 *>Rocky Mountain Forest and Range Experiment Station, USDA Forest Service, Fort Collins, Colorado, USA 'EAWAG/ETH Zurich, Dubendorf, Switzerland Abstract A dry deposition model including chemical reactions for NO, NO? and Ck is developed with properties suitable as a module within larger Eulerian air quality models. The model is investigated with sensitivity tests and observations over grass. It appears that accurate NO surface emissions are needed for better comparison with traditional constant flux models and observations. 1 Introduction The need to include chemical reactions in models of dry depositions for NO, NO? and possibly O, has been demonstrated for example by Kramm et al.[l], and Arellano and Duynkerke [2]. Lenschow [3] explained that these chemic
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