Modeling Of Transient Enhanced Dopant Diffusion By Using A Moment-based Model Describing Point-defect Clustering
Price
Free (open access)
Transaction
Volume
22
Pages
10
Published
1999
Size
980 kb
Paper DOI
10.2495/ES990191
Copyright
WIT Press
Author(s)
D. Stiebel, P. Pichler and H. Ryssel
Abstract
The accurate simulation of the transient enhanced diffusion (TED) of do- pants during the post-implantation anneal is still a big challenge for process simulation. As a point-defect mediated process, the kinetics of TED is mainly determined by the interaction of intrinsic point defects with extended defects formed by point-defect agglomeration. Using a continuum model for the simulation, the reaction-diffusion equations describing the behavior of the species considered have to be solved numerically. In such an approach, a partial differential equation has to be solved for each kind and each size of extended defects. Because extended defects may consist of some hundred point defects, such models lead to inadmissibly high CPU times and CPU resources
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